Title:
RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2013140203
Kind Code:
A
Abstract:
To provide a radiation-sensitive composition that is useful as a resist material and includes a compound represented by a specific chemical constitution formula, and a resist pattern forming method using the radiation-sensitive composition.
A radiation-sensitive composition includes a compound (A) represented by the formula (1), where X and Y individually independently represent a substituted or non-substituted hydroxyaryl group.
Inventors:
ECHIGO MASATOSHI
TAKASUKA DAIKO
YAMAKAWA MASAKO
TAKASUKA DAIKO
YAMAKAWA MASAKO
Application Number:
JP2011289492A
Publication Date:
July 18, 2013
Filing Date:
December 28, 2011
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO
International Classes:
G03F7/004; C07C37/20; C07C39/15; G03F7/038; H01L21/027
Domestic Patent References:
| JP2012171943A | 2012-09-10 | |||
| JP2011195515A | 2011-10-06 |
Foreign References:
| WO2011049021A1 | 2011-04-28 | |||
| WO2011037072A1 | 2011-03-31 |
Attorney, Agent or Firm:
Kenji Sugimura
Kazuyuki Tomita
Kengo Yoshida
Kazuyuki Tomita
Kengo Yoshida
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