To attain effective sensitivity to various radiations, to improve resolution, pattern shape, PED stability, etc., to reduce baking temp. dependency and to enhance process stability by incorporating a compd. having a specified substituent, a specified polymer having a specified ratio of wt. average mol. wt. (Mw) expressed in terms of polystyrene to number average mol. wt. (Mn) expressed in terms of polustyrence and a radiation sensitive acid generating agent.
The radiation sensitive compsn. contains a compd. having -C(= O)-OC(CH3)3 as a substituent having an acid cleavable t-butyl group, a polymer having acid decomposable acetal or ketal groups and an Mw to Mn ration 1-3 and 0.1-20 pts.wt., preferably 0.5-10 pts.wt. radiation sensitive acid generating agent based on 100 pts.wt. polymer.
SAKURAI AKIHIKO
TANABE TAKAYOSHI
ISAMOTO YOSHITSUGU
