Title:
RADIATION SENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2002055448
Kind Code:
A
Abstract:
To provide a radiation sensitive composition containing a high molecular compound containing sulfonic acid groups.
The radiation sensitive composition contains a high molecular compound derived from a polyvalent polymer containing a polymeric principal chain and plural pendant hydroxyl groups in combination with a diazo compound and a photopolymerizable compound or a positive working photo-solubilizable compound. The high molecular compound contains plural substituted sulfonate groups bonding to carbon atoms of the polyvalent polymer and plural substituted urethane groups of formula (1) bonding to carbon atoms of the polyvalent polymer.
Inventors:
POTTS RODNEY M
ETHERINGTON TERENCE
REN JIAN RONG
ETHERINGTON TERENCE
REN JIAN RONG
Application Number:
JP2001178447A
Publication Date:
February 20, 2002
Filing Date:
February 13, 1991
Export Citation:
Assignee:
AGFA GEVAERT NV
International Classes:
C08F8/30; C08F8/34; C08F8/36; C08F8/44; G03F7/035; C08K5/23; C08L101/00; C08L101/02; G03F7/004; H01L21/027; (IPC1-7): G03F7/035; C08F8/34; C08K5/23; H01L21/027
Attorney, Agent or Firm:
Heiyoshi Odashima