Title:
RADIATION-SENSITIVE MIXTURE
Document Type and Number:
Japanese Patent JPH04215662
Kind Code:
A
Abstract:
PURPOSE: To economically obtain a positive photoresist having good reproducibility and high resolving power by a short-wave UV.
CONSTITUTION: This radiation-sensitive mixture consists of a polymer binder composed mainly of novolac base insoluble in water and soluble in an aq. alkaline soln. or a polymer binder mixture, an onium salt generating a strong acid when exposed to radiation and a pyrocatechol derivative suppressing the solubility of the polymer base in the aq. alkaline soln.
Inventors:
ZON GUIEN KIMU
Application Number:
JP2464991A
Publication Date:
August 06, 1992
Filing Date:
February 19, 1991
Export Citation:
Assignee:
BASF AG
International Classes:
G03F7/004; G03F7/023; G03F7/029; G03F7/039; H01L21/027; (IPC1-7): G03F7/004; G03F7/023; G03F7/029; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Tajiro Taiji