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Title:
RADIATION SENSITIVE MIXTURE
Document Type and Number:
Japanese Patent JPH07333844
Kind Code:
A
Abstract:

PURPOSE: To obtain a novel mixture having high radiation sensitivity in a radiation region, developable with an org. alkali soln., forming a stable acid latent image and used for the production of a semiconductor structure by incorporating specified compds.

CONSTITUTION: This radiation sensitive mixture contains a binder insoluble in water but soluble in an aq. alkali soln., a compd. having at least one bond which can be cleaved by an acid or a compd. having at least one bond which is crosslinked with the binder by the acid, a compd. forming the acid under radiation and a basic iodonium compd. as essential components. Each of these components may be used as a mixture of two or more kinds of such components. The content of the basic iodonium compd. is 0.01-2.00mol equiv. to the max. amt. of the acid theoretically formed from the acid forming compd. Any iodonium compd. having satisfactory solubility and thermal stability in a resist and contg. a satisfactory basic counter ion is suitable for use as the basic iodonium compd.


Inventors:
MASUDA SEIYA
MUNIRACHIYUNA PADOMANABAN
KUDO TAKANORI
KINOSHITA YOSHIAKI
SUEHIRO NATSUMI
NOZAKI YUKO
OKAZAKI HIROSHI
KURAUSU YURUGEN SHIBERA
Application Number:
JP1995000080519
Publication Date:
December 22, 1995
Filing Date:
April 05, 1995
Export Citation:
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Assignee:
HOECHST JAPAN
International Classes:
G03F7/004; B01J39/18; C07C17/35; C07C25/18; G03F7/029; G03F7/033; G03F7/038; G03F7/039; H01L21/027; (IPC1-7): G03F7/029; B01J39/18; C07C17/35; C07C25/18; G03F7/004; G03F7/033; G03F7/038; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Kazuo Sato (2 outside)