Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
RADIATION-SENSITIVE RESIN COMPOSITION AND SULFONIUM SALT
Document Type and Number:
Japanese Patent JP2011016970
Kind Code:
A
Abstract:

To provide a radiation-sensitive resin composition and a sulfonium salt capable of forming a chemically amplified positive resist film.

The composition comprises a resin and an acid generator represented by formula (1), wherein R1 and R2 each denote a substituted or unsubstituted aryl group, R3 denotes a substituted aryl group, an unsubstituted aryl group, or a substituted or unsubstituted heterocyclic group.


More Like This:
JP2018048274ACTIVE ENERGY RAY-CURABLE COMPOSITE RESIN COMPOSITION, ACTIVE ENERGY RAY-CURABLE COMPOSITE RESIN ADHESIVE USING THE COMPOSITION, AND ADHESIVE TAPE FOR BONDING OPTICAL MEMBER
JP2000327758UNSATURATED GROUP-BEARING POLYCARBOXYLIC ACID RESIN, RESIN COMPOSITION AND CURED PRODUCT THEREOF
Inventors:
MARUYAMA KEN
SHIMIZU DAISUKE
Application Number:
JP2009164239A
Publication Date:
January 27, 2011
Filing Date:
July 10, 2009
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
JSR CORP
International Classes:
C08F2/50; G03F7/004; G03F7/039
Domestic Patent References:
JP2004250427A2004-09-09
JP2005104956A2005-04-21
JP2010235579A2010-10-21
JP2004250427A2004-09-09
Foreign References:
WO2009020089A12009-02-12
Attorney, Agent or Firm:
Kiyoshi Kojima
Yoshinobu Hagino
Naoya Taniguchi



 
Previous Patent: LIQUID POLYIMIDE COMPOSITION AND POLYIMIDE FILM

Next Patent: METHOD FOR PRODUCING REGENERATION RAW MATERIAL FOR RE-SYNTHESIZING UNSATURATED POLYESTER RESIN BY DE...