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Title:
RADIATION-SENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2005331824
Kind Code:
A
Abstract:

To provide a radiation-sensitive resin composition having excellent latitude characteristics of the focal depth, line edge roughness characteristics and line end foreshortening characteristics while keeping high resolution as a chemically amplified resist.

The composition contains: an acid dissociable group-containing resin (A) which is alkali insoluble or hardly soluble with alkali and is changed into alkali-soluble by the effect of an acid; and a radiation-sensitive acid generating agent (B). The acid dissociable group-containing resin (A) is an acid dissociable group-containing copolymer containing a repeating unit expressed by formula (1) and a repeating unit expressed by formula (2). The radiation-sensitive acid generating agent (B) contains a sulfoneimide compound and an iodnoium salt.


Inventors:
Nagai, Tomoki
Tsuji, Takayuki
Shimizu, Daisuke
Application Number:
JP2004000151712
Publication Date:
December 02, 2005
Filing Date:
May 21, 2004
Export Citation:
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Assignee:
JSR CORP
International Classes:
G03F7/039; C08F232/08; G03F7/004; G03F7/033; H01L21/027; (IPC1-7): G03F7/039; C08F232/08; G03F7/004; G03F7/033; H01L21/027
Attorney, Agent or Firm:
和気 操