Title:
RADIATION-SENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JPH02185556
Kind Code:
A
Abstract:
PURPOSE:To obtain a positive resist with high sensitivity, excellent pattern profile and developability and a high resolution by incorporating a specified high-MW phenol resin, quinonediazide sulfonate of a low-MW phenol resin and a quinonediazide compd. CONSTITUTION:50-95pts.wt. resin (the wt.-average MW in terms of polystyrene of 2,000-10,000) obtd. by condensing m-cresol and a phenol except m-cresol of the formula [wherein R<1> to R<3> are the same or different each other and each H, OH, R<4>, OR<4> or COOR<4> (wherein R<4> is a 1-4C alkyl)] with aldehydes, 5-50 pts.wt. 1,2-quinonediazide sulfonate of the same type of said resin with a wt.-average MW in terms of polystyrene of 200-2,000 and 3-50 pts.wt. 1,2- quinonediazide compd. are compounded to prepare a radiation-sensitive resin compsn.
Inventors:
MIYASHITA SATOSHI
YAMANOUCHI AKIHIRO
NOZUE IKUO
MIURA TAKAO
YAMANOUCHI AKIHIRO
NOZUE IKUO
MIURA TAKAO
Application Number:
JP450889A
Publication Date:
July 19, 1990
Filing Date:
January 11, 1989
Export Citation:
Assignee:
JAPAN SYNTHETIC RUBBER CO LTD
International Classes:
G03F7/023; C08K5/16; C08L61/04; C08L61/10; H01L21/027; H01L21/30; (IPC1-7): C08L61/10; G03F7/023; H01L21/027
Domestic Patent References:
| JPS61267043A | 1986-11-26 | |||
| JPS50125806A | 1975-10-03 | |||
| JPS61203449A | 1986-09-09 | |||
| JPS6448849A | 1989-02-23 | |||
| JPS61267113A | 1986-11-26 | |||
| JPS6042753A | 1985-03-07 | |||
| JPS57101833A | 1982-06-24 |
Attorney, Agent or Firm:
Kawakita Takecho
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