Title:
RADICAL CURABLE COMPOSITION AND CURED PRODUCT
Document Type and Number:
Japanese Patent JP2023084042
Kind Code:
A
Abstract:
To provide a radical curable composition which is curable at low temperatures, and enables production of a cured product excellent in hardness and light permeability.SOLUTION: A radical curable composition contains (A) a compound that is an addition reaction product of (a) a compound represented by formula (1) and/or a compound in which a silyl group is added to 1,3,5-positions in formula (1), and (b) a compound having one or more (meth)acrylic groups and addition reactive carbon-carbon double bond-containing groups other than the (meth)acrylic group in one molecule, and having no polycyclic hydrocarbon skeleton, and that is one or more (meth)acrylic groups in one molecule, and (B) a polymerization initiator. In formula (1), R1 is independently a substituted or unsubstituted monovalent hydrocarbon group which does not include an addition reactive carbon-carbon double bond-containing group, and has 1 to 12 carbon atoms, or an alkoxy group having 1 to 6 carbon atoms.SELECTED DRAWING: None
Inventors:
ASAKURA AIRI
KIMURA SHINJI
HIRANO DAISUKE
KIMURA SHINJI
HIRANO DAISUKE
Application Number:
JP2021198138A
Publication Date:
June 16, 2023
Filing Date:
December 06, 2021
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
C08F20/10
Attorney, Agent or Firm:
Mikio Yoshimiya
Toshihiro Kobayashi
Toru Otsuka
Toshihiro Kobayashi
Toru Otsuka