To suppress deterioration of wave absorbing characteristic even in a short-wavelength frequency band and to make the title absorber be of a thin type by a method wherein poly (β-hydroxybutylate) or a copolymer thereof is made a dielectric layer and a resistive film is formed at least on one surface of this dielectric layer.
Poly (β-hydroxybutylate) or a copolymer thereof is made a dielectric layer 1 and a resistive film 2 is formed at least on one surface of this dielectric layer 1 by using a thin film prepared by ion plating, evaporation, sputtering or the like of a metal oxide, a metal nitride or a mixture thereof. Besides, the relative dielectric constant of the dielectric layer is improved by controlling the orientation by poling by an electric field. Moreover, a metal layer 3 is laminated on the surface of the dielectric layer whereon the resistive film 2 is not formed, and protective layers 4 and 5 of organic macromolecular films or sheets are formed on the surfaces of the resistive film 2 and the metal layer 3 respectively.
OSHIMA KENSHO
ENDO MITSUO
JPH05114813A | 1993-05-07 | |||
JPH0372473A | 1991-03-27 | |||
JPH0784281A | 1995-03-31 | |||
JPS5244542A | 1977-04-07 |
Next Patent: ELECTROMAGNETIC SHIELDING STRUCTURE