PURPOSE: To attain excellent transparency particularly to ultraviolet rays and sufficient dry etching resistance by using a polymer or a copolymer of cyclohexylmaleimide.
CONSTITUTION: The radiosensitive material is composed of a polymer or a copolymer of cyclohexylmaleimide. A resist made from the radiosensitive material is applied on the substrate to be processed to form a resist layer. The resist layer is selectively exposed to radiosensitive rays to be developed and a resist pattern is formed. In this case, the typical example of a comonomer constituting the useful copolymer is a monomer having a structure generating an alkali-soluble group by the action of an acid-generating agent and t- butylmethacrylate or tetrahydropyranyl methacrylate is exemplified as the monomer. It is particularly advantageous for the radiosensitive material to use the copolymer with the acid-generating agent.
Yuko Kaimoto
Koji Nozaki
