To provide a raw material vaporizing apparatus capable of increasing the vaporization amount per unit time of a film deposition material, and consistently feeding gas of the predetermined amount.

In the raw material vaporizing apparatus comprising a container 110 to store a raw material to be vaporized, and a heating unit 120 to heat the container 110, and capable of feeding the raw material vaporized in the container 110 to a film deposition chamber 1, a plurality of annular projections 114 are protruded upwardly from a bottom surface 113 of the container 110, and the projections 114 are formed so as to demarcate a downwardly tapered inclined surface 114a. The contact area of the raw material with the container 110 is increased to increase the vaporization amount per unit time, movement and collapse of the raw material are promoted by the action of the inclined surface 114a to continuously obtain the consistent vaporization amount.