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Patent Searching and Data


Title:
REACTION FURNACE OF SEMICONDUCTOR MANUFACTURING EQUIPMENT
Document Type and Number:
Japanese Patent JPH0831756
Kind Code:
A
Abstract:

PURPOSE: To conduct a cleaning work of an exhaust system efficiently and make the shape of an exhaust pipe simple and reduce the manufacturing cost by installing a removable wall face coating member on a face facing a region where a reaction by-product attaches.

CONSTITUTION: A shield sleeve 14 is set in a section facing a space 5 on an inner face of an inlet flange 4. An exhaust chamber 20 connected to an exhaust cylinder 15 which is connected to the inlet flange 4 has a flat box 17 whose end face is closed by a removable cover 19. Exhaust gas flows into the inlet flange 4 through a lower end of the space 5 facing the inner face of the inlet flange 4 and it is suddenly cooled at a point when it is circulated in a connection channel 21 and a reaction by-product attaches the shield sleeve 14 and an inner face of a box 22 in connection channel. In order to eliminate the attached reaction by-product, the cover 19 is removed and the box 22 in the connection channel is taken out and the inlet flange 4 is removed and the shield sleeve 14 is taken out and then the shield sleeve 14 and the box 22 in the connection channel are cleaned.


Inventors:
TOMEZUKA KOJI
SATO TAKAYUKI
KAIHATSU HIDEKI
Application Number:
JP18185094A
Publication Date:
February 02, 1996
Filing Date:
July 11, 1994
Export Citation:
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Assignee:
KOKUSAI ELECTRIC CO LTD
International Classes:
H01L21/205; H01L21/304; H01L21/31; (IPC1-7): H01L21/205; H01L21/304; H01L21/31
Attorney, Agent or Firm:
Miyoshi Shoji