To provide a material that permits photo-patterning, is heat-resistant, retains high insulating properties over a long period of time, has flexibility suitable for a flexible substrate and the like without detriment to fundamental properties of a solder resist, a color resist and the like and is hardly deteriorated or discolored even by high temperatures or light.
A reactive polyurethane compound (A) is obtained by allowing an epoxy carboxylate compound (a), obtained by allowing an epoxy resin (i) containing no aromatic ring and bearing two epoxy groups in one molecule to react with a compound (ii) bearing both at least one polymerizable ethylenically unsaturated group and at least one carboxy group in one molecule, a compound (b) bearing both two hydroxy groups and at least one carboxy group in one molecule, and a compound (c) containing no aromatic ring and bearing two isocyanate groups in one molecule to react. An acid-modified product of the compound is provided. The active energy ray-curable resin composition comprises the compound. A cured product of the compound is also provided.
HORIGUCHI TAKAFUMI
OGI SATOSHI
| JP2001033960A | 2001-02-09 | |||
| JP2001033959A | 2001-02-09 | |||
| JP2003122001A | 2003-04-25 | |||
| JP2001247638A | 2001-09-11 | |||
| JPH0952925A | 1997-02-25 | |||
| JP2002338652A | 2002-11-27 |
| WO2004079452A1 | 2004-09-16 |
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