Title:
シリコンの生産のための反応器および方法
Document Type and Number:
Japanese Patent JP5749730
Kind Code:
B2
Abstract:
Reactor for production of silicon, comprising a reactor volume, distinctive in that the reactor comprises or is operatively arranged to at least one means for setting a silicon-containing reaction gas for chemical vapor deposition (CVD) into rotation inside the reactor volume. Method for production of silicon.
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| JP6582883 | Polycrystalline silicon reactor |
| JPS6246912 | PRODUCTION OF HIGH PURITY SILICON |
Inventors:
Filtwedt Joseph
Filtwedt Werner Oh.
Holt Alve
Filtwedt Werner Oh.
Holt Alve
Application Number:
JP2012541045A
Publication Date:
July 15, 2015
Filing Date:
November 25, 2010
Export Citation:
Assignee:
Dynatec Engineering AS
International Classes:
C01B33/035; C01B33/027
Domestic Patent References:
| JP9199435A | ||||
| JP5139891A | ||||
| JP61236608A |
Foreign References:
| WO2005016820A1 | ||||
| US4343772 |
Attorney, Agent or Firm:
Shigenori Tada
Masahiro Terada
Masahiro Terada