REAL-TIME CONTROL SYSTEM OF COMPOSITION FOR LITHOGRAPHY PROCESS USING NEAR-INFRARED SPECTROSCOPE AND METHOD FOR CONTROLLING SAME

Japanese Patent JP2005260238

A

To provide a real-time control system of a composition for a lithography process using a near-infrared spectroscope and a method for controlling the same.

The system includes a composition transport device that draws out a composition in a tank 10 that stores compositions used in a lithography process, and then transports the composition into the tank 10 that further stores compositions through a flow cell 70; a composition analyzer that measures the absorbance of the composition passing through the flow cell 70, and calculates the concentration of each component of the composition using the measured absorbance; an insufficient-component adding/supplying device for adding an insufficient additive liquid into a tank, when concentration of the measured, one component is lower than a predetermined value; and a control part that controls the insufficient-component adding/supplying device according to the components of the composition analyzed by the composition analyzer to adjust the concentration of each component of the composition.

LEE KI-BEOM
LEE JAE-KU
PARK MI-SUN
KIM JONG-MIN
LEE MIN-GUN

JP2005066538A

September 22, 2005

March 10, 2005

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DONGJIN SEMICHEM CO LTD

G03F7/32; G03F7/00; G03F7/26; H01L21/027; H01L21/306; G01N1/20; (IPC1-7): H01L21/027; G03F7/32; H01L21/306

JPH0650260A	1994-02-22
JPH08278635A	1996-10-22
JPH11133619A	1999-05-21
JP2001217185A	2001-08-10
JP2000147785A	2000-05-26

WO2002054155A1

2002-07-11

Takao Suzuki
Koichi Kajisaki
Yuzo Ozaki
Toshihiko Taniguchi

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