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Patent Searching and Data


Title:
RECORDING MEDIUM AND ITS MANUFACTURE
Document Type and Number:
Japanese Patent JPH087331
Kind Code:
A
Abstract:

PURPOSE: To provide a high-quality recording medium which has a small error at the time of reproduction by forming of SiCTi the protective film of a recording medium which is provided with a protective film and a recording film on a substrate.

CONSTITUTION: This recording medium is provided with a protective film and a recording film on a substrate, and SiCTi is used as the protective film Particularly, it is preferable that the ratio of Ti is 0.5 to 7 atoms % and that the film is formed by a d.c. sputtering method. Even when the film is formed by the d.c. sputtering method, arc-discharge can be suppressed, and a pin hole in the formed film can be reduced. By using SiCTi as a protective film material, it becomes feasible to perform d.c. sputtering, and the speed of forming a film is increased to enhance productivity, and arc-discharge can be suppressed to be able to obtain a dense protective film in which a pin hole is reduced. Accordingly, a high-quality recording medium which has a small error at the time of reproduction can be obtained at a low cost.


Inventors:
Kaneko, Hideo
Tokunaga, Katsushi
Tawara, Yoshio
Application Number:
JP1994000132861
Publication Date:
January 12, 1996
Filing Date:
June 15, 1994
Export Citation:
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Assignee:
SHIN ETSU CHEM CO LTD
International Classes:
G11B11/105; G11B7/24; G11B7/254; G11B7/257; G11B7/26; G11B11/10; (IPC1-7): G11B7/24; G11B7/26; G11B11/10
Attorney, Agent or Firm:
山本 亮一 (外1名)