Title:
RECOVERING METHOD FOR WASTE WATER FROM SEMICONDUCTOR WASHING
Document Type and Number:
Japanese Patent JP3746803
Kind Code:
B2
Abstract:
PURPOSE: To provide a simple separation method of microbial cells remaining in treated water for recovering and reutilizing the treated water in which the waste water from semiconductor washing was biologically treated.
CONSTITUTION: In a recovering method for the waste water from semiconductor washing for supplying it to an ultrapure water manufacturing process after a biological treatment for the waste water from semiconductor washing, the treated water produced by the biological treatment for the waste water from semiconductor washing in a biological reaction tank, is catalytically treated with an OH type anion exchange resin, preferably a strong basic anion exchange resin.
Inventors:
Hisanao Kano
Takashi Ozaki
Kenji Oda
Takashi Ozaki
Kenji Oda
Application Number:
JP2450795A
Publication Date:
February 15, 2006
Filing Date:
January 20, 1995
Export Citation:
Assignee:
Nippon Rensui Co., Ltd.
International Classes:
C02F1/28; C02F9/00; C02F1/42; (IPC1-7): C02F9/00; C02F9/00; C02F9/00; C02F9/00; C02F1/28; C02F1/42
Domestic Patent References:
| JP6045036B2 | ||||
| JP6063592A | ||||
| JP8150400A | ||||
| JP7313994A |
Attorney, Agent or Firm:
Hajime Hasegawa
Kimura Hayashi
Sumiko Matsuda
Kimura Hayashi
Sumiko Matsuda