Title:
REFLECTING MIRROR AND ITS MANUFACTURE, AND PROJECTION EXPOSURE DEVICE USING SAME
Document Type and Number:
Japanese Patent JP3538284
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To transfer a deformed certificate component to a mask without any diffraction phenomenon by equipping a reflecting mirror, used for a deformed lighting projection exposure device, with a total reflection area and a total absorption area.
SOLUTION: This reflecting mirror consists of the area 41 where light is totally reflected and the area 43 where light is totally absorbed. In this case, the area 41 where the light is totally reflected has its light reflection factor set preferably to ≥80%, and phase-movement and partial reflection areas 45 and 46 are formed preferably in one of a circular, an elliptic, and a polygonal shape. The phase movement and partial reflection areas 45 and 46 preferably have 5-30% reflection factors and the phase movement of reflected light is preferably 90-270° and more preferably 180°. The light in the phase movement areas 45 and 46 can be shifted in phase by etching a substrate and changing the path of the reflected light, or combining the etching of the substrate and the formation of a phase shifting material layer together.
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Inventors:
Kim, Cheol-hong
Sohn, Chang-jin
Sohn, Chang-jin
Application Number:
JP23420896A
Publication Date:
June 14, 2004
Filing Date:
September 04, 1996
Export Citation:
Assignee:
SAMSUNG ELECTRON CO LTD
International Classes:
G02B5/08; G03F1/00; G03F1/26; G03F1/52; G03F7/20; H01L21/027; (IPC1-7): G02B5/08; H01L21/027
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