Title:
REFLECTION MASK BLANK AND MANUFACTURING METHOD FOR REFLECTION MASK
Document Type and Number:
Japanese Patent JP3681381
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a reflection mask blank and a manufacturing method for a reflection mask, wherein the influence of stress of a multilayered reflection film is moderated, and it is highly flat.
SOLUTION: In the manufacturing method for a reflection mask blank 100, including a multilayered reflection film 13 provided on a substrate 11 for reflecting exposure light, and further including a buffer layer 14 and an absorber layer 15 for absorbing exposed light provided on the multilayer reflection film 13. In the manufacturing method, it comprises a process for forming a stress correction film 12, having smaller film stress than the absolute value of film stress of the multilayer reflection film 13 in the opposite direction to the film stress of the multilayer reflection film 13 between the substrate 11 and the multilayer reflection film 13, and a process for heating the multilayer reflection film 13. The reflection mask 101 is manufactured by forming a pattern on the absorber layer 15.
Inventors:
Lol Ki Tsutomu
Hosoya Morio
Ken Kinoshita
Hosoya Morio
Ken Kinoshita
Application Number:
JP2003298691A
Publication Date:
August 10, 2005
Filing Date:
August 22, 2003
Export Citation:
Assignee:
HOYA CORPORATION
International Classes:
G21K1/06; G03F1/22; G03F1/24; G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F1/16; G03F7/20; G21K1/06
Domestic Patent References:
| JP2002222764A | ||||
| JP2002015981A | ||||
| JP11354407A | ||||
| JP8051066A | ||||
| JP6299326A |
Foreign References:
| US6309705 |
Attorney, Agent or Firm:
Takeshi Otsuka
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