PURPOSE: To provide an excellent reflection type alkaline photoelectric surface by specifying an adhering weight of antimony in the reflection type alkaline photoelectric surface where antimony and plural kinds of alkaline metals are included in a base substrate.
CONSTITUTION: An Sb thin layer activated with alkaline metal such as Cs, K, Na or Rb is accumulated on a base substrate made of Ni or the like, thus obtaining a reflection type alkaline photoelectric surface. An adhering weight of Sb is set to 10-100μg/m2, thus obtaining the excellent reflection type alkaline photoelectric surface of high sensitivity and a high yield. Consequently, it is possible to provide the reflection type alkaline photoelectric surface suitable for a photomultiplier.
IIDA TAKEHIRO
MURATA TETSUO
SUZUKI SHINJI
WASHIYAMA HIROAKI
WATASE YASUSHI
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