Title:
反射型マスクブランク、反射型マスクの製造方法、及び半導体装置の製造方法
Document Type and Number:
Japanese Patent JP6636581
Kind Code:
B2
Inventors:
Youhei Ikebe
Takahiro Onoue
Lol Ki Tsutomu
Takahiro Onoue
Lol Ki Tsutomu
Application Number:
JP2018144921A
Publication Date:
January 29, 2020
Filing Date:
August 01, 2018
Export Citation:
Assignee:
HOYA CORPORATION
International Classes:
G03F1/24; G03F1/26; G03F1/48; G03F1/52; G03F1/54
Domestic Patent References:
| JP6381921B2 | ||||
| JP2010080659A | ||||
| JP2011228417A | ||||
| JP2013122952A | ||||
| JP2004006798A | ||||
| JP2015122468A | ||||
| JP2011081356A |
Foreign References:
| WO2012105508A1 | ||||
| US20130316272 | ||||
| US20050208389 | ||||
| WO2011068223A1 | ||||
| US20120219890 | ||||
| US20070128528 |
Attorney, Agent or Firm:
Hiroshi Oshino
Takafumi Oshima
Takafumi Oshima