Title:
REFLECTIVE AND REFRACTIVE REDUCTION PROJECTION OPTICAL SYSTEM
Document Type and Number:
Japanese Patent JPH0588088
Kind Code:
A
Abstract:
PURPOSE:To employ constitution wherein a reflection and refraction system uses luminous flux on an optical axis and to eliminate deterioration in resolving power. CONSTITUTION:This optical system has a 1st lens group G1 which has negative refracting power and diffuses luminous flux from a reticle 1, a half-mirror 5 which transmits luminous flux from this 1st lens group G1, three parallel plane plates 2, 3, and 4 which are arranged between the 1st lens group G1 and half-mirror 5 slantingly to the optical axis and compensate aberration due to the half-mirror 5, a concave surface reflecting mirror 7 which returns luminous flux projected by the half-mirror 5 to the half-mirror 5 while converting it, and a 2nd lens group G3 which has positive refracting power and converges luminous flux returned to the half-mirror 5 and reflected by the half-mirror 5 to form a reduced image of a pattern on its reticle 1.
Inventors:
HASHIMOTO SUMIO
ICHIHARA YUTAKA
ICHIHARA YUTAKA
Application Number:
JP27659391A
Publication Date:
April 09, 1993
Filing Date:
September 28, 1991
Export Citation:
Assignee:
NIKON CORP
International Classes:
G02B1/02; G02B17/08; (IPC1-7): G02B1/02; G02B17/08
Attorney, Agent or Firm:
Satoshi Omori