Title:
REFORMED FLUORORESIN COVERING MATERIAL AND METHOD OF PRODUCING THE SAME
Document Type and Number:
Japanese Patent JP2011105012
Kind Code:
A
Abstract:
To provide a practical method for producing a fluororesin covering material which has high adhesiveness between a fluororesin and a substrate and does not cause distortion.
The method of producing the reformed fluororesin covering material includes processes of: covering the substrate surface having thermal stability at a temperature exceeding the melting point of the fluororesin with the fluororesin; subsequently irradiating the surface of a film of the fluororesin with ionizing radiation; and generating crosslinking reaction of the fluororesin and chemical reaction between the fluororesin and the substrate surface at the same time to achieve strong adhesion between the fluororesin and the substrate surface.
Inventors:
IKEDA SHIGETOSHI
OSHIMA AKIHIRO
UDAGAWA CHIE
TABATA YONEO
OSHIMA AKIHIRO
UDAGAWA CHIE
TABATA YONEO
Application Number:
JP2011031954A
Publication Date:
June 02, 2011
Filing Date:
February 17, 2011
Export Citation:
Assignee:
RAYTECH CORP
International Classes:
B32B27/30; B05D3/06; B05D7/24; C08J7/00; C08J7/04
Domestic Patent References:
| JPH11147291A | 1999-06-02 | |||
| JP2000178362A | 2000-06-27 |
Attorney, Agent or Firm:
Shinjiro Ono
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Isoyama Asami
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Isoyama Asami