Title:
調整装置、および荷電粒子マルチ・ビームレット・リソグラフィ・システム
Document Type and Number:
Japanese Patent JP2013508992
Kind Code:
A
Abstract:
The invention relates to a modulation device for use in a charged particle multi-beamlet lithography system. The device includes a body comprising an interconnect structure provided with a plurality of modulators and interconnects at different levels within the interconnect structure for enabling connection of the modulators to one or more pattern data receiving elements. A modulator includes a first electrode, a second electrode, and an aperture extending through the body. The electrodes are located on opposing sides of the aperture for generating an electric field across the aperture. At least one of the first electrode and the second electrode includes a first conductive element formed at a first level of the interconnect structure and a second conductive element formed at a second level of the interconnect structure. The first and second conductive elements are electrically connected with each other.
Inventors:
Wieland, Marco Januyako
Jagel, Remco
Van Fern, Alexander Hendrik Vincent
Stanblink, Steen Willem Hermann Karel
Jagel, Remco
Van Fern, Alexander Hendrik Vincent
Stanblink, Steen Willem Hermann Karel
Application Number:
JP2012535796A
Publication Date:
March 07, 2013
Filing Date:
October 26, 2010
Export Citation:
Assignee:
Mapper Lithography IPB.V.
International Classes:
H01L21/027; G03F7/20; H01J37/305
Domestic Patent References:
| JPH05109608A | 1993-04-30 | |||
| JP2002217090A | 2002-08-02 | |||
| JP2006210460A | 2006-08-10 | |||
| JP2006504134A | 2006-02-02 |
Attorney, Agent or Firm:
Kurata Masatoshi
Satoshi Kono
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Katsu Sunagawa
Satoshi Kono
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Katsu Sunagawa