REMOTE MONITORING SYSTEM OF POLISHING END POINT DETECTION DEVICE

Title:

REMOTE MONITORING SYSTEM OF POLISHING END POINT DETECTION DEVICE

Document Type and Number:

Japanese Patent JP2013176828

Kind Code:

A

Abstract:

To provide a remote monitoring system that can remotely monitor and control a plurality of polishing end point detection devices.

A remote monitoring system includes: a plurality of polishing end point detection devices 10; and a host computer 20 connected to the plurality of polishing end point detection devices 10 via a network 1. The host computer 20 includes: a memory for storing polishing end point detection data sent from the plurality of polishing end point detection devices 10; and a display screen for displaying the polishing end point detection data. The host computer 20 sends a new polishing end point detection recipe to at least one polishing end point detection device selected from the plurality of polishing end point detection devices 10, and rewrites the polishing end point detection recipe of the selected at least one polishing end point detection device.

Inventors:

MITANI RYUICHIRO

Application Number:

JP2012043174A

Publication Date:

September 09, 2013

Filing Date:

February 29, 2012

Export Citation:

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Assignee:

EBARA CORP

International Classes:

B24B49/04; B24B37/013; B24B49/10; B24B51/00; H01L21/304

Domestic Patent References:

JPH1174170A	1999-03-16
JP2008251050A	2008-10-16
JP2008129622A	2008-06-05
JPH10143231A	1998-05-29
JP2007272383A	2007-10-18

Foreign References:

US20110104987A1

2011-05-05

Attorney, Agent or Firm:

Isamu Watanabe
Ryoji Kosugi
Tetsuya Hirosawa

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