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Patent Searching and Data


Title:
RESIDUAL LIQUID DISCHARGE DEVICE IN VAPORIZER
Document Type and Number:
Japanese Patent JPH1068499
Kind Code:
A
Abstract:

To dispense with a residual liquefied gas discharge device, and to stabilize the calorie of the vaporized gas by forming an inlet pipe to feed the raw material from a raw material supply source to a lower header tank in up-grade condition, and installing a bypass to connect the immediately downstream of a main control valve of the inlet pipe to an outlet piping of an vaporizer.

In stopping the operation, supply of the raw material liquefied gas is stopped, a main control valve 2 and an outlet side control valve 5 are closed, and a bypass control valve 7 of a bypass piping 6 is opened to continue vaporization of the liquefied gas left in the vaporizer 1. The pressure in the vaporizer 1 is increased by the vaporized gas. Because the inlet pipe 3 is arranged in up-grade condition toward the vaporizer 1, the residual liquefied gas flows toward the upstream of the inlet pipe 3 by the gravity and is pushed up in the bypass pipe 6. The liquefied gas is vaporized while it passes through a heat radiation pipe 8, and fed into an outlet pipe 4. The liquefied gas is not left in the inlet pipe 3, and fluctuation in calorie caused by the residual heavy component is eliminated in the re-starting.


Inventors:
SHINKAI KOICHI
UNO KOJI
KUROSE KATSUO
TSUKAMOTO AKIO
SAKURABA ICHIRO
KONISHI KEIZO
HISAKADO YOSHINORI
TAKADA MASANORI
YAMAZAKI TAKASHI
SHIMOKAWATOKO TAKAYUKI
OSADA YOSHIHIRO
MURO YOSHIHIRO
Application Number:
JP22713596A
Publication Date:
March 10, 1998
Filing Date:
August 28, 1996
Export Citation:
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Assignee:
KOBE STEEL LTD
OSAKA GAS CO LTD
International Classes:
F17C9/00; F17C9/02; (IPC1-7): F17C9/00; F17C9/02
Attorney, Agent or Firm:
Etsushi Kotani (2 outside)