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Title:
残留溶媒抽出方法および同により生成される微粒子
Document Type and Number:
Japanese Patent JP2005502674
Kind Code:
A
Abstract:
Methods for preparing microparticles having reduced residual solvent levels are disclosed. Microparticles are contacted with a non-aqueous washing system to reduce the level of residual solvent in the microparticles. Preferred non-aqueous washing systems include 100% ethanol and a blend of ethanol and heptane. A solvent blend of a hardening solvent and a washing solvent can be used to harden and wash microparticles in a single step, thereby eliminating the need for a post-hardening wash step.

Inventors:
Ricky, Michael, Yi.
Ram Stack, J., Michael
Kumar, Rajesh
Application Number:
JP2003524554A
Publication Date:
January 27, 2005
Filing Date:
August 26, 2002
Export Citation:
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Assignee:
Arcams Controlled Therapeutics, Incorporated Two
International Classes:
A61K9/16; A61K31/519; A61K38/00; A61K38/04; A61K47/32; A61K47/34; B65D5/462; B01J8/02; B01J13/08; B01J13/12; B01J13/20; B01J14/00; B01J19/12; B01J19/24; B65D5/46; B65D5/465; B65D71/00; B65D71/36; (IPC1-7): A61K9/16; A61K31/519; A61K38/00; A61K38/04; A61K47/32; A61K47/34
Domestic Patent References:
JPH09505308A1997-05-27
JPH04505454A1992-09-24
JPH11506764A1999-06-15
JPH04506931A1992-12-03
JPS5793912A1982-06-11
Foreign References:
WO1989003678A11989-05-05
WO1999015154A11999-04-01
Other References:
JPN7009001185, Eur j pharm biopharm, 1996, Vol.42, No.1, pages 16−24
Attorney, Agent or Firm:
Yoshiyuki Inaba
Katsuro Tanaka
Shinji Oga