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Title:
RESIDUE OF REDUCED PRESSURE DISTILLATION, METHOD FOR PRODUCING THE SAME, AND PLASTICIZER CONTAINING THE RESIDUE OF REDUCED PRESSURE DISTILLATION
Document Type and Number:
Japanese Patent JP2004331815
Kind Code:
A
Abstract:

To provide a highly safe residue of reduced pressure distillation.

The residue of the reduced pressure distillation comprises a residue of the second reduced pressure distillation obtained by subjecting a residue of the first reduced pressure distillation already subjected to the reduced pressure distillation, to the reduced pressure redistillation. The residue of the first reduced pressure distillation is generally the residue obtained by subjecting a residue of atmospheric pressure distillation, obtained by subjecting a crude oil to the atmospheric pressure distillation, to the reduced pressure distillation, but the residue obtained by directly subjecting the crude oil to the reduced pressure distillation can be also used. The content of 18C-22C polycyclic aromatics can be regulated so as to be <5 ppm in each of the residues of the first and second reduced pressure distillation by carrying out the reduced pressure distillation at 350-500°C expressed in terms of the temperature reduced to atmospheric temperature in the residue of the first reduced pressure distillation, or by carrying out the reduced pressure distillation at 500-600°C expressed in terms of the temperature reduced to atmospheric temperature in the residue of the second reduced pressure distillation.


Inventors:
OKAMOTO TAKAYUKI
Application Number:
JP2003129503A
Publication Date:
November 25, 2004
Filing Date:
May 07, 2003
Export Citation:
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Assignee:
SANKYO YUKA KOGYO KK
International Classes:
C10G7/06; C10C1/04; (IPC1-7): C10C1/04; C10G7/06
Attorney, Agent or Firm:
Nobuaki Arai