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Title:
RESIN COMPOSITION, ARTIFICIAL MARBLE OBTAINED BY FORMING THE SAME AND PRODUCTION OF THE MARBLE
Document Type and Number:
Japanese Patent JPH1045815
Kind Code:
A
Abstract:

To provide a resin composition suitable for easily producing an artificial marble less in discoloration and the artificial marble less in discoloration.

This resin composition contains 100 pts.wt. unsaturated monomer consisting of methylmethacrylate as a main component and/or an acrylic syrup, 2-120 pt.wt. compound having at least two epoxide groups is one molecule, 0.3-1.5 equivalent dicyanodiamide based on the epoxide group, 0.01-5 pt.wt. radical polymerization initiator, 30-800 pt.wt. inorganic filler, and as necessary a compound having an imidazole skeleton as a curing accelerator. The resin composition is polymerized at 30-100°C after pouring the same into a mold to form a soft type acrylic resin, and then an artificial marble less in discoloration is obtained by forming the soft type acrylic resin with a heat-compression at 90-200°C.


Inventors:
AMEKAWA MUTSUHIDE
Application Number:
JP20744696A
Publication Date:
February 17, 1998
Filing Date:
August 06, 1996
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C04B26/06; C04B26/14; C04B32/00; C08F2/44; C08F20/10; C08F20/14; C08G59/44; C08L33/04; C08L33/12; (IPC1-7): C08F2/44; C04B26/06; C04B26/14; C04B32/00; C08G59/44
Attorney, Agent or Firm:
Takashi Kuboyama (1 person outside)