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Patent Searching and Data


Title:
RESIN COMPOSITION EXCELLENT IN LIGHT RESISTANCE
Document Type and Number:
Japanese Patent JPH101606
Kind Code:
A
Abstract:

To obtain a resin composition excellent in light resistance and surface beautifying property and obtain a molding composed of a resin composition.

This resin composition is obtained by blending 100 pts.wt. polyketone resin (I) with 0.1-20 pts.wt. block copolymer (III) composed of a polymer block (A) comprising 0.1-5 pts.wt. amino group-containing hindered amine-based compound (II), 30-100mol% aromatic vinyl-based monomer unit and 70-0mol% vinyl-based monomer unit copolymerizable therewith and a polymer block (B) comprising 0.1-100mol% vinyl-based monomer unit having at least one kind of functional group selected from carboxyl groups, epoxy groups and carboxylic acid anhydride groups and 99.9-0mol% vinyl-based monomer unit copolymerizable therewith. This molding is obtained from the resin composition.


Inventors:
MAEKAWA KAZUHIKO
UNO MASANARI
MIURA TSUTOMU
Application Number:
JP15675896A
Publication Date:
January 06, 1998
Filing Date:
June 18, 1996
Export Citation:
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Assignee:
KURARAY CO
International Classes:
C08K5/17; C08L73/00; (IPC1-7): C08L73/00; C08K5/17