RESIN COMPOSITION HAVING IMPROVED RESISTANCE TO BLISTERING

Japanese Patent JPH0425555

A

PURPOSE:To obtain the title compsn. having a low unreacted monomer content and excellent coatability, etc., by mixing two specific graft copolymers obtd. by graft copolymerizing vinyl comps. onto rubberlike polymers and a vinyl copolymer. CONSTITUTION:A graft copolymer prepd. by copolymerizing a vinyl cyanide compd. (A) with an arom. vinyl compd. (S) and optionally further a copolymerizable monomer (E) onto secondary particles (B-1) having diameters of 2000Angstrom to 2mum formed by the agglomeration of primary particles of a rubber like polymer having diameters of 500-2000Angstrom , a graft copolymer prepd. by graft copolymerizing A and S or A, S, and E onto non-agglomerated particles of a rubber like polymer having diameters of 500Angstrom to 2mum (B-2), and a copolymer of A and S or A, S, and E (e.g. an acrylonitrile/styrene/butyl acrylate copoly mer) are mixed in such amts. that A/(A+S+E) is 27-50wt.%, (B-1)+(B-2) accounuts for 10-30wt.% of the total compsn., and (B-1)/(B-2) is 0.3-3, thereby giving the title compsn. contg. 10000 ppm or lower unreacted monomer and oligomer having a mol.wt. of 400 or lower.

SHICHIZAWA ATSUSHI
UMEDA NORIAKI

JP13032990A

January 29, 1992

May 22, 1990

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ASAHI CHEMICAL IND

C08L25/12; C08L51/00; C08L51/04; C08L55/00; C08L55/02; (IPC1-7): C08L25/12; C08L51/04; C08L55/02

Nozaki

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