Title:
RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2017072843
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a resin composition excellent in LWR (line width roughness) performance, CD (critical dimension) uniformity, and the like.SOLUTION: A resin composition for forming a protective film for immersion exposure is provided, which comprises a first polymer having a structural unit represented by formula (1) and a solvent. In formula (1), Rrepresents a monovalent organic group having 1-30 carbon atoms; Y represents a single bond, a divalent hydrocarbon group having 1-30 carbon atoms, or a divalent group containing a hetero atom and having 1-30 carbon atoms; Rand Reach independently represent a hydrogen atom, a fluorine atom, or a monovalent hydrocarbon group having 1-30 carbon atoms; Rrepresents a hydrogen atom or a monovalent organic group having 1-30 carbon atoms. When Ris a monovalent hydrocarbon group having 1-30 carbon atoms, Y is a divalent group containing an oxycarbonyl group or the like between carbon atoms or at a terminal.SELECTED DRAWING: None
Inventors:
SATO MITSUHISA
ODA TOMOHIRO
ODA TOMOHIRO
Application Number:
JP2016220010A
Publication Date:
April 13, 2017
Filing Date:
November 10, 2016
Export Citation:
Assignee:
JSR CORP
International Classes:
G03F7/039; C08F22/10; G03F7/038; G03F7/11; G03F7/20
Domestic Patent References:
| JP2007140228A | 2007-06-07 | |||
| JP2006184575A | 2006-07-13 | |||
| JPH1017623A | 1998-01-20 | |||
| JP2005107476A | 2005-04-21 |
Foreign References:
| WO2013069750A1 | 2013-05-16 | |||
| US20120003589A1 | 2012-01-05 | |||
| WO2013147267A1 | 2013-10-03 |
Attorney, Agent or Firm:
Hajime Amano