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Title:
RESIN COMPOSITION, POLYIMIDE METAL LAMINATE USING THE SAME, AND ELECTRONIC CIRCUIT SUBSTRATE
Document Type and Number:
Japanese Patent JP2013018806
Kind Code:
A
Abstract:

To provide a resin composition having low dielectric dissipation factor and high surface smoothness; and a metal laminate using the resin composition.

The resin composition includes: (a) an aromatic polyimide prepared by reacting a diamine compound including an aromatic diamine compound with a tetracarboxylic dianhydride including an aromatic tetracarboxylic dianhydride; and (b) a cage type silsesquioxane partial cleavage structure having a silanol group and a phenyl group and having a dielectric loss tangent lower than that of the aromatic polyimide (a). In the aromatic polyimide, a ratio of the total of the aromatic diamine compound and the aromatic tetracarboxylic dianhydride to the total of the diamine compound and the tetracarboxylic dianhydride is ≥70 mol%, and when two or more aromatic rings are connected mutually in the molecule in the aromatic diamine compound or the aromatic tetracarboxylic dianhydride, aromatic rings are connected mutually via a single bond.


Inventors:
NISHIURA KATSUNORI
TORIIDA MASAHIRO
TAKAGI TOSHIHIKO
TAMAI MASAJI
HE CHAO-BIN
MYA KHINE YI
YANG SHAO
LI XU
Application Number:
JP2011150944A
Publication Date:
January 31, 2013
Filing Date:
July 07, 2011
Export Citation:
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Assignee:
MITSUI CHEMICALS INC
AGENCY SCIENCE TECH & RES
International Classes:
C08L79/08; B32B15/088; B32B27/18; C08K5/5435; H05K1/03
Attorney, Agent or Firm:
Koichi Washida
Kazuto Iinuma