Title:
RESIN COMPOSITION, PRODUCTION METHOD OF RESIN COMPOSITION, RESIST COMPOSITION CONTAINING RESIN COMPOSITION, AND PATTERN FORMING METHOD USING RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2014136706
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide: a resin composition through a simple method, which is suitably used for a resist material containing a carboxyl group, and has a narrow molecular weight distribution; a production method of the resin composition; a resist composition containing the resin composition; and a pattern forming method using the resist composition.SOLUTION: The resin composition contains a borane-based radical polymerization initiator (A), a vinyl monomer (B) containing a carboxyl group and a vinyl monomer (C) that does not contain a carboxyl group.
Inventors:
MURAKI TAKAHITO
NUNOE JUN
NUNOE JUN
Application Number:
JP2013004257A
Publication Date:
July 28, 2014
Filing Date:
January 15, 2013
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
C08F220/04; C08F4/44; C08F212/06; C08F220/18; G03F7/033; H01L21/027
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Attorney, Agent or Firm:
Yamato Tsutsui