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Title:
RESIN COMPOSITION, PRODUCTION METHOD OF RESIN COMPOSITION, RESIST COMPOSITION CONTAINING RESIN COMPOSITION, AND PATTERN FORMING METHOD USING RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2014136706
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide: a resin composition through a simple method, which is suitably used for a resist material containing a carboxyl group, and has a narrow molecular weight distribution; a production method of the resin composition; a resist composition containing the resin composition; and a pattern forming method using the resist composition.SOLUTION: The resin composition contains a borane-based radical polymerization initiator (A), a vinyl monomer (B) containing a carboxyl group and a vinyl monomer (C) that does not contain a carboxyl group.

Inventors:
MURAKI TAKAHITO
NUNOE JUN
Application Number:
JP2013004257A
Publication Date:
July 28, 2014
Filing Date:
January 15, 2013
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
C08F220/04; C08F4/44; C08F212/06; C08F220/18; G03F7/033; H01L21/027
Domestic Patent References:
JP2011231340A2011-11-17
JP2009169406A2009-07-30
JP2000504353A2000-04-11
JPH11503729A1999-03-30
JP2009074068A2009-04-09
JP2005330446A2005-12-02
JP2004331762A2004-11-25
JPH08127607A1996-05-21
JPS572309A1982-01-07
JP2006145775A2006-06-08
JP2007515547A2007-06-14
JPS5411149A1979-01-27
JP2008026358A2008-02-07
JP2006348290A2006-12-28
JP2007522333A2007-08-09
Attorney, Agent or Firm:
Yamato Tsutsui