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Title:
RESIN COMPOSITION FOR SEMICONDUCTOR SEALING, PRODUCTION METHOD THEREOF, AND SEMICONDUCTOR APPARATUS
Document Type and Number:
Japanese Patent JP2013001861
Kind Code:
A
Abstract:

To provide a resin composition for semiconductor sealing, excellent in thermal conductivity, moldability, humidity-tolerant reliability and reflow resistance, and to provide a production method thereof and a semiconductor apparatus.

The resin composition for semiconductor sealing contains a cresol novolak type epoxy resin, phenol novolak resin, curing accelerator, silica containing at least crystalline silica of an average particle diameter of 10-60 μm, and SiC of an average particle diameter of 10-80 μm, obtained by heat treatment at ≥800°C, wherein a total content of silica and SiC is 75-90 mass%, a volume filling factor of the crystalline silica is ≥25 vol.% and ≤50 vol.%, and a volume filling factor of SiC is ≥20 vol.% and ≤37 vol.%. The production method of the resin composition and the semiconductor apparatus are provided.


Inventors:
WATANABE SUSUMU
FUKUKAWA HIROSHI
Application Number:
JP2011136118A
Publication Date:
January 07, 2013
Filing Date:
June 20, 2011
Export Citation:
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Assignee:
KYOCERA CHEM CORP
International Classes:
C08L63/00; C08G59/62; C08K3/34; H01L23/29; H01L23/31
Attorney, Agent or Firm:
Tamotsu Otani
Masamichi Tohei