Title:
RESIN HAVING HYPERBRANCHING STRUCTURE AND RESIST AGENT USING THE SAME
Document Type and Number:
Japanese Patent JP2006016534
Kind Code:
A
Abstract:
To provide a resin suitable for resist applications which allows an exposed part to be sufficiently cured even under a low-energy UV-irradiation condition and a target developed pattern to be obtained at a high speed.
There is provided a resin having a hyperbranching structure into which an unsaturated linkage group is introduced. Preferably, the hyperbranching structure of the resin is formed from a polycondensate of an ABX type molecule, wherein A and B are each an organic group having distinct functional groups a and b, respectively; the functional groups a and b can undergo chemically induced condensation reaction and addition reaction with each other; and X denotes an integer of 2 or more.
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Inventors:
KITSUMOTO HIROTOSHI
HACHITSUKA TSUYOSHI
HAMAZAKI AKIRA
HACHITSUKA TSUYOSHI
HAMAZAKI AKIRA
Application Number:
JP2004196868A
Publication Date:
January 19, 2006
Filing Date:
July 02, 2004
Export Citation:
Assignee:
TOYO BOSEKI
International Classes:
C08G85/00; G03F7/027