Title:
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2016130309
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a resin and a resist composition which make it possible to produce a resist pattern with excellent line edge roughness.SOLUTION: The present invention provides a resin having a structural unit derived from a compound represented by formula (I) [where, Ris a hydrogen atom or a methyl group. Ris a hydrogen atom, a hydroxy group or a C1-C12 hydrocarbon group, -CH- included in the hydrocarbon group is optionally substituted by -O-or -CO-. m is an integer of 1-6 . When m is 2 or more, two or more Rmay be the same or different, two or more Rmay together form a ring. X is an oxygen atom or a sulfur atom. Ais a single bond and the like.SELECTED DRAWING: None
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Inventors:
MASUYAMA TATSURO
MIYAGAWA TAKAYUKI
ICHIKAWA KOJI
MIYAGAWA TAKAYUKI
ICHIKAWA KOJI
Application Number:
JP2016001963A
Publication Date:
July 21, 2016
Filing Date:
January 07, 2016
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C08F22/22; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2014071216A | 2014-04-21 | |||
| JP2002023371A | 2002-01-23 | |||
| JP2012189977A | 2012-10-04 | |||
| JP2011039502A | 2011-02-24 | |||
| JP2009244859A | 2009-10-22 |
Foreign References:
| WO2003031414A1 | 2003-04-17 |
Other References:
MERO, CHRISTOPHER L. ET AL., JOURNAL OF ORGANIC CHEMISTRY, vol. 65(3), JPN6019045172, 2000, pages 775 - 781, ISSN: 0004158011
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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