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Patent Searching and Data


Title:
RESIN AND RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2023052409
Kind Code:
A
Abstract:
To provide a resist composition from which a resist pattern having a good shape and good crack resistance can be produced.SOLUTION: A resin contains a structural unit represented by formula (I-2). [Ri45 represents a C3-10 alicyclic hydrocarbon group which may be substituted with a hydroxyl group, or a C2-7 acyl group.]SELECTED DRAWING: None

Inventors:
Masako Sugihara
Takashi Nishimura
Application Number:
JP2023004345A
Publication Date:
April 11, 2023
Filing Date:
January 16, 2023
Export Citation:
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Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C08F212/14; C08F220/06; C08F220/18; C08F220/26; G03F7/039
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP