To provide a resist applying device which obviates the occurrence of a coating application defect and development defect by preventing the propagation of the microorganisms intruding into a casein stock soln. or resist.
This resist applying device has a compounding tank 6 to which the pure water, casein stock soln. and dichromate stock soln. respectively fed from a pure water tank 2, a casein tank 3 and a dichromate tank 4 and metered in a metering tank 5 are compounded to form a new liquid, a pair of storage tanks 7, 8 which store the resist compounded in the compounding tank 6, a resist tank 9 which applies the resist on a metallic thin sheet 1, a first recovering tank 13 for recovering the resist flowing over from the resist tank 9, a second recovering tank 14 for feeding the resist recovered by the first recovering tank 13 to the compounding tank 6 and an alkaline soln. tank 15 for storing the alkaline soln. as a sterilizing liquid.
TANAKA NAOTAKE
EBARA MASAAKI
