Title:
RESIST APPLYING METHOD
Document Type and Number:
Japanese Patent JP2003195248
Kind Code:
A
Abstract:
To provide a resist applying method by which resist can be applied properly even to a gap part of color filters and a proper electrode without disconnection can be formed.
The center line of a rectangular mother substrate 1 is inclined by 5° against the rotation axis of a coating roll 4 to convey the mother substrate 1 and resist is applied while the coating roll 4 is rotated.
Inventors:
IKEZU TERU
Application Number:
JP2001396818A
Publication Date:
July 09, 2003
Filing Date:
December 27, 2001
Export Citation:
Assignee:
OPTREX KK
NIPPON SEIKI CO LTD
NIPPON SEIKI CO LTD
International Classes:
G03F7/16; B05D1/28; G02B5/20; G02F1/13; (IPC1-7): G02F1/13; B05D1/28; G02B5/20; G03F7/16
Attorney, Agent or Firm:
Shunsuke Nakao (3 outside)