RESIST COMPOSITION FOR ELECTRON BEAM OR X-RAY

Title:

RESIST COMPOSITION FOR ELECTRON BEAM OR X-RAY

Document Type and Number:

Japanese Patent JP2001281864

Kind Code:

A

Abstract:

To provide positive type and negative type resist compositions for electron beams or X-rays having high resolving power without causing the lowering of sensitivity and capable of giving a pattern profile excellent in rectangularity and to provide positive type and negative type resist compositions for electron beams or X-rays excellent in appliability (intrasurface uniformity).

The objective resist composition for electron beams or X-rays contains (a) a compound which generates an acid when irradiated with electron beams or X-rays and (b) electrically conductive fine particles or at least one selected from the group comprising electrically conductive organic polymers.

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Inventors:

ADEGAWA YUTAKA

Application Number:

JP2000094752A

Publication Date:

October 10, 2001

Filing Date:

March 30, 2000

Export Citation:

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Assignee:

FUJI PHOTO FILM CO LTD

International Classes:

G03F7/039; C08F2/54; C08F8/12; C08F12/22; C08F34/02; C08F257/02; C08F269/00; C08K5/00; C08L101/12; G03F7/004; G03F7/038; H01L21/027; (IPC1-7): G03F7/039; C08F2/54; C08F8/12; C08F12/22; C08F34/02; C08F257/02; C08F269/00; C08K5/00; C08L101/12; G03F7/004; G03F7/038; H01L21/027

Attorney, Agent or Firm:

Shohei Oguri (4 outside)

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