RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Japanese Patent JP2013080109

A

To provide a resist composition excellent in lithography characteristics and pattern shape and to provide a method for forming a resist pattern.

A resist composition includes: a base component (A) generating an acid by exposure in which a solubility of the base component in a developer is changed by an action of an acid; an acid generator component (C) generating an acid having a pKa of 0 or more by exposure (excluding the base component (A)); and an acid generator component (B) generating an acid by exposure (excluding the base component (A) and the acid generator component (C)), where the base component (A) contains a polymer (A1) having an anion moiety generating an acid by exposure on at least one terminal of the main chain.

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UTSUMI YOSHIYUKI
DAZAI NAOHIRO

JP2011220101A

May 02, 2013

October 04, 2011

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TOKYO OHKA KOGYO CO LTD

G03F7/004; C07C61/135; C07C65/10; C07C309/12; C07C311/04; C07C381/12; G03F7/039; H01L21/027

JP2013057836A

2013-03-28

WO2011070947A1

2011-06-16

Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi

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