Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2013122570
Kind Code:
A
Abstract:

To provide a method for forming a resist pattern, by which a negative pattern can be formed with high resolution and in a favorable shape, and to provide a resist composition suitable to be used for the method.

The method for forming a resist pattern includes the steps of: (1) forming a resist film 2 by coating a support body 1 with a resist composition containing a base component (A) that generates a base by exposure and increases the solubility with an alkali developing solution by an action of an acid; (2) exposing the resist film 2; (3) baking the resist film after the step (2); and forming a negative resist pattern by developing the resist film 2 with an alkali to dissolve and remove an unexposed portion 2b of the resist film 2. The resist composition used for the step (1) is also disclosed.


Inventors:
SHIMIZU HIROAKI
NAKAMURA TAKESHI
YOKOYA JIRO
NITO TAKEHITO
Application Number:
JP2012140216A
Publication Date:
June 20, 2013
Filing Date:
June 21, 2012
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
C08F212/14; G03F7/038; C08F220/36; C08F226/02; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
JPH07261393A1995-10-13
JP2011102974A2011-05-26
JP2012018197A2012-01-26
JP2012018198A2012-01-26
JP2012181510A2012-09-20
JPH07261393A1995-10-13
JP2011102974A2011-05-26
JP2012018197A2012-01-26
JP2012018198A2012-01-26
JP2012181510A2012-09-20
Foreign References:
US20030008240A12003-01-09
US20020187436A12002-12-12
US20020160318A12002-10-31
US20020160316A12002-10-31
US20030008240A12003-01-09
US20020187436A12002-12-12
US20020160318A12002-10-31
US20020160316A12002-10-31
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi