To provide a novel compound, an acid generator using the compound, a resist composition including the acid generator, and a method for forming a resist pattern using the composition.
The resist composition comprises: a base component (A) showing changes in the solubility with an alkali developing solution by an action of an acid; and an acid generator component (B) including a compound expressed by formula (b1-1). In the formula, R1" to R3" represent an aryl group or an alkyl group, in which at least one group is a substituted aryl group substituted with a group expressed by formula (b1-1-0), and any two groups may be bonded to each other to form a ring together with a sulfur atom in the formula; X10 represents a cyclic group having 3 to 30 carbon atoms: Q3 represents a single bond or a divalent linking group; Y10 represents -C(=O)- or -SO2-; Y11 represents an alkyl group or a fluorinated alkyl group having 1 to 10 carbon atoms; and W represents an alkylene group having 2 to 10 carbon atoms.
UTSUMI YOSHIYUKI
SESHIMO TAKEHIRO
KAWAKAMI AKINARI
| JP2008191413A | 2008-08-21 | |||
| JP2008189601A | 2008-08-21 | |||
| JP2007277219A | 2007-10-25 | |||
| JP2008268921A | 2008-11-06 | |||
| JP2001019799A | 2001-01-23 | |||
| JP2008257198A | 2008-10-23 | |||
| JP2008089790A | 2008-04-17 |
| WO2010055406A2 | 2010-05-20 |
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi