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Title:
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, PRODUCTION METHOD OF COMPOUND, AND POLYMERIC COMPOUND
Document Type and Number:
Japanese Patent JP2014035413
Kind Code:
A
Abstract:

To provide a resist composition excellent in various lithographic characteristics such as LWR (line width roughness) and sensitivity, a method for forming a resist pattern, a method for producing a compound, and a polymeric compound.

The resist composition generates an acid by exposure and shows changes in the solubility with a developing solution by an action of the acid; and the composition comprises a base component (A) showing changes in the solubility with a developing solution by an action of an acid. The base component (A) contains a polymeric compound (A1) having a structural unit (a0) expressed by general formula (a0-1). In the formula, Ra01 represents a lactone-containing cyclic group except for a 2-oxatricyclo[4.2.1.04,8]nonan-3-on ring, a carbonate-containing cyclic group or -SO2- containing cyclic group.


Inventors:
IRIE MAKIKO
NAKAMURA TAKESHI
Application Number:
JP2012175993A
Publication Date:
February 24, 2014
Filing Date:
August 08, 2012
Export Citation:
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Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
G03F7/039; C08F22/10; G03F7/038; H01L21/027
Domestic Patent References:
JP2007270128A2007-10-18
JP2000159758A2000-06-13
JP2004252405A2004-09-09
JP2007086285A2007-04-05
JP2004292781A2004-10-21
JP2004149754A2004-05-27
JP2011180393A2011-09-15
JP2007270128A2007-10-18
JP2000159758A2000-06-13
JP2004252405A2004-09-09
JP2007086285A2007-04-05
Foreign References:
US3225008A1965-12-21
US3225008A1965-12-21
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi



 
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