To provide a resist composition that can give a sufficient focus margin (DOF).

There is provided a resist composition comprising: (A) a resin having a structural unit derived from a compound represented by formula (a); and (B) an acid generator. In formula (a), R¹ represents a hydrogen atom or a methyl group. A¹ is represented by formula (a-g1):-(A¹⁰-X¹⁰)_s-A¹¹- (In formula (a-g1), s represents an integer of 0 to 2, A¹⁰ and A¹¹ each independently represent an aliphatic hydrocarbon group having 1 to 5 carbon atoms or the like, and X¹⁰ represents an oxygen atom, carbonyl group, carbonyloxy group, oxycarbonyl group or the like.), and R² represents an optionally substituted aliphatic hydrocarbon group having 1 to 18 carbon atoms, or the like.