Title:
RESIST COMPOSITION AND METHOD OF PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2015172746
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a resist composition which improves the focus margin (DOF) on the + defocus side in producing a resist pattern.SOLUTION: A resist composition comprises a compound of formula (I0), a resin having acid-labile groups and an acid generator. In formula (I0), Ris a 1-24C hydrocarbon group; a methylene group contained in the hydrocarbon group may be replaced with an oxygen atom or a carbonyl group; a hydrogen atom contained in the hydrocarbon group may be replaced with a hydroxy group or a halogen atom; Ris a 1-12C hydrocarbon group, a 1-6C alkoxy group, a 2-7C acyl group, a 2-7C acyloxy group, a 2-7C alkoxycarbonyl group, a nitro group, a hydroxy group or a halogen atom; m is an integer of 0-4; for m equal to or greater than 2, two or more R's may be identical or different.
Inventors:
MASUYAMA TATSURO
YASUE TAKAHIRO
ICHIKAWA KOJI
YASUE TAKAHIRO
ICHIKAWA KOJI
Application Number:
JP2015031377A
Publication Date:
October 01, 2015
Filing Date:
February 20, 2015
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; G03F7/038; G03F7/039; H01L21/027
Domestic Patent References:
| JP2006257078A | 2006-09-28 |
Foreign References:
| US5230986A | 1993-07-27 |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto