Title:
RESIST COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN, AND SALT
Document Type and Number:
Japanese Patent JP2020177238
Kind Code:
A
Abstract:
To provide a resist composition capable of producing a resist pattern with good line edge roughness.SOLUTION: The resist composition contains: a resin containing a structural unit represented by Formula (a2-A) and a structural unit having an acid-labile group; and a salt represented by Formula (I). [In the formula, R1a and R2a each represent a hydrogen atom or a hydrocarbon group or are bonded to each other to form a ring; and R3a represents a hydrogen atom or is bonded to R1a and R2a to form a ring.]SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2020071672A
Publication Date:
October 29, 2020
Filing Date:
April 13, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C69/157; C07C309/17; C07D307/00; C07D321/10; C08F212/14; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation