Title:
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2022161855
Kind Code:
A
Abstract:
To provide a resist composition from which a resist pattern having good line edge roughness (LER) can be produced.SOLUTION: A resist composition contains a compound represented by Formula (I), a resin having an acid-labile group, and an acid generator. [In the formula, R1 represents *-R10 or *-L2-CO-O-R10; R2 represents *-R10, -CO-R10, *-CO-O-R10, *-L2-CO-O-R10 or *-CO-O-L2-CO-O-R10; R10 represents a base-labile group; L2 represents an optionally substituted C1-6 alkanediyl group; and R3 represents a halogen atom, a hydroxyl group, a C1-6 fluorinated alkyl group or a C1-12 alkyl group, provided that -CH2- contained in the alkyl group may be substituted with -O- or -CO-.]SELECTED DRAWING: None
Inventors:
KITA YUJI
SAITO MARINA
ICHIKAWA KOJI
SAITO MARINA
ICHIKAWA KOJI
Application Number:
JP2022059403A
Publication Date:
October 21, 2022
Filing Date:
March 31, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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